The Power of Lithography in Microfluidic Manufacturing
Photo and nanoimprint lithography are groundbreaking microfabrication techniques that are shaping the future of microfluidics. These techniques meticulously transfer patterns onto a substrate and define microscale features with exceptional detail.
Photo Lithography
This traditional approach uses UV light to transfer a pattern from a mask to a light-sensitive layer applied on the substrate. It's versatile, enabling two primary processes: UV contact and stepper lithography, catering to features ranging from sub-micrometer to larger scales.
Nano Imprint Lithography (NIL)
A physical method that impresses a pattern onto a substrate using a mold. It excels at creating extremely fine features down to sub-100 nm, suitable for applications requiring intricate patterns and high density.
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Unlock the full potential of lithography method for your microfluidic projects with our customised workshops. Tailored to your individual needs, these sessions dive deep into specifying product requirements and establishing the optimal process for your project. By focusing on precision and efficiency from the outset, we ensure that your project is compliant with industry standards and optimised for success.
Custom Workshops for Precision Lithography
Compatible with a variety of substrates, enabling flexibility in device design and application.
Versatility across Materials
Streamlines the manufacturing process, allowing for quicker prototyping and production cycles.
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Efficiency and Speed
Especially beneficial in mass production, reducing the per-unit cost of microfluidic devices.
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Cost-Effective for High Volume
Key Benefits of Lithography for Microfluidic Replication
Considerations for Choosing NI-/Photo Lithography for Microfluidic Chip Production
Photo Lithography: Ideal for features larger than 1 micron, with the choice between UV contact and stepper lithography impacting the achievable resolution and aspect ratio. Consider if the method can meet the precision requirements of your microfluidic design.
Nano Imprint Lithography (NIL): Best for applications demanding sub-100 nm precision. Evaluate whether the ultra-high resolution and pattern fidelity of NIL align with the complexity and scale of your microfluidic structures.
Feature Size and Resolution
Assess the compatibility of your chosen substrate with the lithography process. Photo lithography typically requires flat and smooth substrates for effective pattern transfer, while NIL can accommodate a broader range of surface topographies. Ensure the material's thermal and mechanical properties are suitable for the specific lithography technique.
Substrate Compatibility
Consider the flexibility of each method for prototyping and design iteration. Photo lithography allows for relatively easy design changes through mask modification but can be costlier and slower for iterative design processes. NIL is highly efficient for prototyping when the master mold is available, but changes in design might require new molds, impacting the timeline and cost.
Flexibility and Prototyping
Reference Cases
We haveve selectively partnered with industry leaders known for their expertise in lithography processes.
Benefit from our network
Contact us to discuss your microfluidic project requirements and objectives.
Consultation
Partner Match
We connect you with the lithography experts from our network.
We oversee the entire project, ensuring smooth coordination and timely delivery.
Project Management
Coloured area indicates the method's ideal chip production volume.
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